What is the use of polysilicon

Polycrystalline silicon is a form of elemental silicon. When the molten elemental silicon is solidified under the condition of supercooling, the silicon atoms are arranged into many crystal nuclei in the form of diamond lattice. If these crystal nuclei grow into grains with different crystal plane orientations, these grains will combine to crystallize into polysilicon.

Polysilicon (polycrystalline silicon) with gray metallic luster, density 2.32~2.34g/cm3. Melting point 1410 ℃. Boiling point 2355 ℃. Soluble in the mixed acid of hydrofluoric acid and nitric acid, insoluble in water, nitric acid and hydrochloric acid. Hardness between germanium and quartz, brittle at room temperature, easy to break when cutting. When heated to above 800 ℃, it has ductility, and when it is 1300 ℃, it shows obvious deformation. Not active at room temperature, high temperature with oxygen, nitrogen, sulfur and other reactions.

In the high temperature melting state, it has greater chemical activity and can interact with almost any material. It has semiconductor properties and is an extremely important and excellent semiconductor material, but a trace amount of impurities can greatly affect its conductivity. The electronics industry is widely used in the manufacture of semiconductor radios, tape recorders, refrigerators, color TVs, video recorders, electronic computers and other basic materials. It is obtained by chlorination of dry silica powder and dry hydrogen chloride gas under certain conditions, and then by condensation, distillation and reduction.